Technology company, I will become the light of China!

Chapter 272 Success! The photolithography factory is realized!

3nm extreme ultraviolet light?

The data feedback given by the beam detection equipment surprised everyone. It was a 3-nanometer extreme ultraviolet beam. Doesn't this mean that they will soon have the conditions to manufacture 3-nanometer chips?

As we all know, without considering "multiple exposure technology", if you want to engrave a chip of a few nanometers, you must first create a UV light source of how many nanometers.

It’s okay to say that deep ultraviolet light of 193 nanometers can also be found in nature, but extreme ultraviolet light of 13.5 nanometers and below must be created by humans.

Deep ultraviolet light and extreme ultraviolet light correspond to DUV lithography machines and EUV lithography machines respectively. The latter is still on the list of equipment prohibited from being exported to China.

Once this light source is confirmed to be extreme ultraviolet light that can be used for photolithography, the entire chip industry will be subverted.

"Is it really 3 nanometers?"

Xia Yang looked excited and took a step forward.

Although he did not study semiconductors in college, it does not mean that he does not understand chip manufacturing.

If you want to lithograph 14-nanometer chips, you need to produce extreme ultraviolet light with a wavelength of 13.5 nanometers. This has long been known to everyone under the overwhelming publicity of various semiconductor consulting media.

3 nanometer wavelength?

Chen Xing recovered from the shock and explained to Lei Bing and Xia Yang: "Having a light source is not enough. If we really want to create a 3-nanometer chip, we have to go through chip design and develop photoresist."

As soon as he finished speaking, he immediately looked at the equipment control console and began to input instructions, occasionally running to the side to operate.

If you want to create a 3-nanometer chip, 3-nanometer extreme ultraviolet light, 3-nanometer chip circuit design, and 3-nanometer exposure wavelength photoresist are all indispensable. This is why the advancement of chip nanometer levels is slow.

"That's two photomasks stacked. The two transparent substrates will weaken the extreme ultraviolet light energy, causing photolithography to fail."

"You can't say that."

It is precisely because of the high technical threshold that the other side of the ocean can make a fuss about chips.

The transport device automatically picks up the film.

The current mainstream chip is 14nm. Whether it is Longxing Technology's SOC God chip, Apple's A9s bionic chip, or the Snapdragon 821 chip just launched by Gaotong, they are all made using 14nm processes and are simply out of reach. 3nm edge.

This is a photolithography factory, or a fully automated photolithography factory.

A photolithography factory is different from a photolithography machine. It is more like a complete automated assembly line. It only needs to load semiconductor silicon wafers, photoresist and supporting reagents. After inputting instructions, automated production can be carried out.

For example, the No. 1 photoresist currently developed by Longxing Chemical has an exposure wavelength of 193 nanometers and supports up to 7 nanometer chip manufacturing. This is with the support of multiple exposure technologies.

Every further step forward requires follow-up from various industries. Once it is said that photoresist is not good, extreme ultraviolet light and circuit design drawings are useless.

"The president is right." Lin Tian also affirmed. He turned back to the two directors and said: "It's too early to talk about 3 nanometer chips, but we can try the extreme ultraviolet light with a wavelength of 13.5 nanometers first. , to see if it can meet chip production needs."

next second.

Lei Bing and Xia Yang nodded.

They know a little bit, but they don't know that the field of semiconductor chips is not only limited to extreme ultraviolet light, but also has many details. Only by conquering them all can they create a chip.

Automatically pick up the film.

Lei Bing couldn't help but step forward and asked: "Can this beam of light be used? If it can be used, does it mean that we can make 3-nanometer chips?"

After inspecting more than a dozen beams of extreme ultraviolet light with a wavelength of 13.5 nanometers, Lin Tian also found the beam with the best monochromaticity and set it as the No. 1 photolithography area.

The first phase is equivalent to testing. Once the testing is passed, the second, third and even fourth phases of the photolithography factory can be expanded.

Wouldn’t it be possible to engrave 3nm chips?

"It's true that we acted too hastily."

"I'll do it right away."

If 3-nanometer chips can really be created, it will not be a small technological shock, but a mushroom bomb thrown at the entire semiconductor chip industry, something that will subvert the entire industry.

Lin Tian murmured to himself.

"Let's test the feasibility of the beam as soon as possible while it's still dark," Chen Xing reminded.

"We do not have a separate and complete photomask for the SOC God chip. We can only use two yin and yang masks stacked together to form a complete pattern. This will cause another problem."

Lin Tian nodded in response.

Semiconductor silicon wafers stored in a specific area are picked up by electrostatic suction cups and transported to the cleaning area to wash away dust and impurities attached to the surface of the semiconductor silicon wafers.

Automated photolithography.

It seemed like he was explaining to Chen Xing and others, but also like he was explaining it to himself.

Of course.

The premise is that photolithography can be successful.

"This sentence makes sense."

Automatic cleaning.

The two photomasks have overlapped, and they are in a specific

This is also the reason why the first phase of the photolithography factory is only 5000 square meters, because it is useless to build it too big. Electrostatic chucks and various types of automated transportation equipment need to be customized and purchased. The key is that some equipment is not available in China. Such as electrostatic chuck equipment.

In the field of semiconductors, not only photolithography machines and ultraviolet light have nanometer levels, but photoresists also have nanometer levels.

After another ten minutes of parameter debugging and troubleshooting, Lin Tian entered the instructions to confirm the work.

Automatic glue application.

They have now turned off the power supply to the entire Shenzhen City. Even if it is 4 o'clock in the morning, it will still have an impact on the city.

After the cleaning is completed, the semiconductor silicon wafer will be transported to the next step through a special transportation channel for baking. After the semiconductor silicon wafer is completely dry, it will continue to be transported to the next step to apply photoresist.

"To solve this problem, I increased the power of the particle accelerator to increase the speed of the electrons again."

"Theoretically, increasing the operating power will simultaneously amplify the speed of electron movement. The faster the electrons move in the ring memory, the stronger the extreme ultraviolet light energy radiated, but I am not sure whether this value is correct. , I can only say that the theory is feasible.”

No one in the photolithography factory has tested it, and no one knows whether it will work.

Now due to photomask restrictions, Lin Tian can only increase the power, which adds a lot of difficulty to the test.

"Just try and you will find out."

Chen Xing silently raised his cell phone to take pictures.

Although they were in the control room, the screen in front of them showed a picture of the clean room, so there was no need to go there in person.

Lin Tian nodded slightly and said nothing. He stared at the surveillance screen and looked extremely nervous.

After drying and cooling, the semiconductor silicon wafer coated with photoresist has been transported to the photolithography area, leaving only the final photolithography step.

As the lens group moves to the designated position, the extreme ultraviolet light with a wavelength of 13.5 nanometers is refracted and accurately illuminates two photomasks with complementary patterns. After the complete pattern on the photomask is illuminated, it finally falls to the surface of the semiconductor silicon wafer to be exposed.

"Zi-"

When the ArF photoresist encounters a light source, a chemical reaction begins inside it.

ArF photoresist is divided into positive resist and reverse resist. The positive resist is used for this exposure. The photoresist in the exposed area will undergo a chemical reaction, while the unexposed area will not be affected.

After an area is exposed, the lens group immediately moves and turns sideways to illuminate the light source. After the moving platform is adjusted, it continues to move back to the normal position to expose the next area for photolithography.

A 12-inch semiconductor silicon wafer can produce approximately 232 1.6×1.6 finished bare wafers, which means that it requires 232 exposures. Currently, the exposure speed is about 1 second, which requires 232 seconds, or almost 4 minutes, to completely expose a semiconductor silicon wafer.

Although this speed is almost twice as slow as that of a lithography machine, the lithography factory is domestically produced and self-developed after all, and it is a first-generation product. Subsequent lens groups and mobile platforms can continue to be optimized to catch up with the optics of the lithography machine. Speed ​​is not impossible.

After waiting for four minutes, Lin Tian looked at Chen Xing and others and explained: "Considering the energy consumption of the two photomasks, we are not in a hurry to take them for development and let the semiconductor silicon wafer be heated again to intensify the photolithography process." The chemical reaction of glue.”

Chen Xing, Lei Bing, and Xia Yang nodded slightly, all waiting for the result.

Now Chen Xing is considered half a layman here, while Lei Bing and Xia Yang are both laymen and can only listen to Lin Tian's arrangements.

Not to mention roasting it, even if it was roasted, they would still think it was reasonable.

As Lin Tian entered the command, the semiconductor silicon wafer that was supposed to be sent for development was transferred to the baking area for secondary heating, which intensified the chemical reaction inside the ArF photoresist.

When this step is completed, the semiconductor wafer is transported again and it comes to the development area.

First, wet the silicon wafer with deionized water, and then place the silicon wafer on the development platform. The machine equipment above sprays the developer liquid evenly on the surface of the semiconductor silicon wafer, further dissolving the exposed areas.

With this step completed, the circuit pattern is clearly visible on the surface of the semiconductor silicon wafer, and only the final rinse is needed to clean off all the photoresist adhered to the unexposed parts.

"I seem to see a pattern."

Lei Bing's eyes widened, not daring to miss any detail.

"I saw it too." Xia Yang agreed.

When the semiconductor silicon wafer was cleaned and taken out just now, you can clearly see the dense circuit patterns on the surface of the silicon wafer.

"It's good to have circuit patterns, but you still need to go through circuit testing to know whether the chip can operate normally."

Chen Xing explained.

After being exposed to Kaitian Chip, Qingzhou Chip, and SOC God Chip many times, he is already considered half an insider.

He knew a thing or two about exposure, etching, development, and cleaning. Of course, he only knew a little bit, and it was still at the level of theoretical knowledge.

But even so, Lei Bing couldn't help but give a thumbs up and praised: "I didn't expect that Mr. Chen not only made achievements in the business field, but also had his own unique insights in the chip field."

"It's really unexpected."

Xia Yang also echoed.

They thought Chen Xing didn't understand anything, but they didn't expect Chen Xing to speak clearly, which surprised them all.

Listening to the two people's praise, Chen Xing also said humbly: "It's not an opinion, it's just a lot of knowledge that I have memorized through my ears and eyes."

"Being able to memorize it is also a skill."

Lei Bing smiled.

Xia Yang also nodded and agreed: "Yes, even those with poor memory can't remember it even if they want to. Mr. Chen can remember these processes, which is enough to show the innocence of Longxing Technology's deep cultivation of chips."

While the two were singing and flattering Chen Xing, the fully automated production line had already sent the developed semiconductor silicon wafers to be sliced ​​for final circuit testing.

Lin Tian looked at the "Under Testing" prompt, looked at Chen Xing and said: "If it can pass, the second phase of the photolithography factory can be started, but energy is still a problem..."

He looked at Xia Yang.

The latter immediately understood and said quickly: "Mr. Chen and Chief Lin, don't worry. As long as it is proven that the photolithography factory is feasible, I will go back and hold a municipal meeting at dawn. The theme is to build your energy transmission channel."

"Yes."

Lei Bing echoed and continued: "I can't guarantee it in other places, but in Shen City, Xia Bureau can still say a few words."

"I will handle it."

Xia Yang patted his chest.

They all work in a mixed system, and of course they understand the current main direction of the country.

If they can assist Longxing Technology in completing the construction of the photolithography factory, then all of them might be able to take a couple of steps forward.

Within the system, who doesn’t want to make progress?

If there is an opportunity for progress, they will not let it go, let alone one involving "chips".

"I would like to thank you both for your kindness first, but..." Chen Xing hesitated for a while, and then decided to reveal the "Eastern Power Diversion to the South" plan promised by Song Weiguo:

"If the photolithography factory is confirmed to be able to produce chips, I hope that the Shenzhen Electric Power Bureau will build more power transmission systems in the Pogouling area to ensure power transmission. As for power, Chief Song of the Fengtian Military Region said that there will be something in the near future. The power transfer document to the south has been released."

Lei Bing: "???"

Xia Yang: "!!!"

The moment these words were spoken, Lei Bing's mind was filled with questions.

Fengtian Military Region?

Isn't this part of the Northern War Zone?

You, Chen Xing, didn’t deal with the southern war zone and went to the northern war zone?

Xia Yang next to him was stunned to the point of surprise. Isn't this a national top-secret document that has just been issued?

Is it possible…

Is it specifically designed to support photolithography factories? ?

Figured out!

Xia Yang finally figured it out!

He said why it was so strange. The eastern region clearly used the State Grid, while Shenzhen City used the China Southern Power Grid. How could power suddenly be delivered to Shenzhen City? There was no shortage of power in Shenzhen City.

It turns out that it specifically supports Longxing Technology in building a photolithography factory. This means that the higher-ups already know about it.

"Gulu——"

Xia Yang swallowed.

He looked at Chen Xing with a hint of awe. This young man who was less than thirty had more energy than he imagined.

If possible, he really wanted to whisper in Chen Xing's ear: "Mr. Chen, I, Xia Yang, really want to make progress."

Just when Lei Bing and Xia Yang were in shock and their minds went blank in shock, Lin Tian suddenly interrupted them and said: "The test results of the bare chip circuit are out."

Chen Xing: "!!!"

Lei Bing: "!!!"

Xia Yang: "!!!"

The three of them immediately looked sideways and looked in the direction Lin Tian was looking. There were eight characters "Circuit No Abnormality Detected" written on it. On the leftmost screen, there were all the data parameters of the SOC God chip, including the nanometer level. , microarchitecture and operating power.

After comparing one by one, Lin Tian looked at Chen Xing and others with excitement and announced: "Success! The photolithography factory has been realized!"

(End of this chapter)