Nuclear power has come out, you say you are an undergraduate?

Chapter 85 Successfully developed!
Nanjiang strategic research base, photoelectric research laboratory.

At this time, the entire research base has restored order.

The impact caused by the low-frequency pulse is indeed quite large, but the duration is less than half an hour.

The most important thing is that Su Chuan has achieved research and development results in such a short period of time.

This hit the hearts of everyone hard.

In the entire Xingtian project, only Su Chuan, the chief engineer, did not have any team and assistants.

In other words, these scientific research results were completed by Su Chuan alone.

These scientists who led their respective teams to research and develop, let alone achieved results.

Until now, there is not even a staged progress.

How could these experts and scientists involved in the Xingtian project not admire Su Chuan?
Obviously, the birth of the Ark Reactor strongly inspired everyone.

If Su Chuan carefully observes the research progress on the system panel.

Then he can see that the progress of the mechanical power armor has increased by at least 50% compared to the past!

Of course, even with such a substantial improvement, the improvement is still slow for the progress of the entire task.

In the optoelectronic laboratory, at the moment, we are constantly trying to develop the lithography machine.

Mr. He was wearing a pair of reading glasses and kept guarding beside the machine.

When the machine was finished, someone immediately delivered the cooled chip to He Zhiyuan.

As the person in charge of optoelectronic research, he also stares at the research and development of lithography machines.

"Old He, take a look!"

The current "chip" cannot be called a chip. Strictly speaking, it should be called a wafer.

This is a raw material for integrated circuit semiconductors!

The current wafer has only gone through the step of photolithography.

After that, etching is required, and a chemical ion mixture is added, so that each transistor after photolithography and etching can be fully opened!

After these processes, the wafer can be called a chip.

Finally, after testing and debugging, these chips can be officially put into use.

He Zhiyuan took off his eyes and took a rough look at the wafer.

There are not too many impurities in the whole!

Subsequent observations also require specialized equipment for inspection.

After all, the photolithography marks at the nanometer level, let alone the naked eye.

Not even a normal microscope can see it.

It must be observed with an optical microscope at the nanometer level.

The display magnification of this microscope is at least 1000 times.

Seeing that Mr. He hurriedly walked, he personally placed the wafer on the special inspection instrument.

On the electronic screen at the side, the situation on the surface of the wafer after zooming in quickly appeared.

For a qualified lithography machine, the surface of the manufactured wafer should be almost the same as their lithography template.

At the same time, at least a 90% success rate must be guaranteed!

"He Lao, how is the effect of this batch of wafers?"

The lithography operator on the side asked.

In the laboratory, everyone was waiting for He Lao's results.

He Zhiyuan didn't speak, and kept dragging the mouse with his hand, observing the situation of the wafer.

After all, it is a lithography machine accurate to the nanometer level!

This research is obviously full of challenges for them!

Soon, he frowned.

Under the watchful eyes of countless researchers, He Laoping shook his head peacefully.

I saw him turn around and read out a few coordinates.

"Pay attention to the coordinates 142, 64 and 7, 69."

"There is almost an error of 3-4 nanometers near these two coordinates!"

He took out the inspected wafer from the instrument and said calmly.

"Such a high error means that we still cannot produce chips below 10 nanometers!"

"There is still a considerable distance from the current high-precision chips in the world."

The researchers and experts around all bowed their heads.

Although that is the case, compared to their previous lithography machine technology, they have grown a lot.

Although the success rate is not high, several 5-nanometer chips have been manufactured before.

He Lao said calmly.

"In addition, I am here to announce a good news and a bad news."

He Zhiyuan's voice made everyone look up again.

This kind of tone of voice doesn't look like Mr. He.

However, the optoelectronic research team still showed curiosity.

"He Lao, tell me!"

He Zhiyuan nodded and said calmly.

"At present, in fact, our exposure system has basically no problems."

"Pulsed cold laser can be used in lithography after reflection."

His tone paused and continued.

"The bad news first."

"The problem now is that there is a problem with the alignment system of the lithography machine."

"After wafer lithography, there is always some deviation!"

He Zhiyuan suddenly revealed a smile.

"As for the good news, I've figured out a solution to this problem!"

"If nothing else, the lithography technology we currently have can at least produce 1-nanometer chips!"

Just when everyone was about to applaud.

He Zhiyuan raised his hand to stop everyone.

"It hasn't worked yet!"

"What's more, this little achievement is not enough for Mr. Su's cold nuclear fusion."

"Hurry up and get the mold of the lithography machine, and print out the work log of the alignment system of the lithography machine."

"I'm going to improve the alignment system of the lithography machine now!"

Under He Lao's words, everyone in the laboratory immediately became busy.

He Zhiyuan looked at the bright light bulb above his head and smiled.

In fact, it still depends on Su Chuan that the lithography machine can make staged progress in such a short period of time.

First of all, Su Chuan's idea of ​​pulsed cold laser directly changed his thinking.

During this time, they have been working with pulsed cold lasers.

Prior to this, the extreme ultraviolet light tried at most guaranteed lithography with a precision of 10 nanometers to 15 nanometers.

Pulsed cold laser is the opposite.

In theory, it can even reach the level of 1 nanometer, or even finer photolithography!

In a short period of time, the core technology of the lithography machine and the exposure system have advanced by leaps and bounds.

Instead, the alignment system started to drag.

But after the low-frequency electromagnetic pulse accident that happened today.

The constantly flickering lights in the laboratory gave He Lao inspiration.

That's right, the fix for the alignment system is simple.

It only needs to turn off the pulsed cold laser repeatedly, and perform photolithography in a flashing manner, and the error caused by continuous operation during photolithography can be greatly reduced.

He looked at the operation log of the alignment system and the wafer mold submitted by several staff members and laughed.

Everything is consistent with his calculations!
From another point of view.

Daxia's high-precision lithography machine can already be announced in advance, and the research and development has been successful!

(End of this chapter)